THE AIM OF THE STUDY

Comparative study of the precision of the junction of modern implant systems with standard and custom abutments.

MATERIALS AND METHODS

The study was carried out by the method of computed X-ray microtomography on an X-ray microtomograph Heliscan micro CT using the ImageJ program in the laboratory «Systems for Microscopy and Analysis» of the Skolkovo Technopark. The measurement of the gap width between the implant and the abutment for each sample was carried out at 20 points according to the algorithm: the total length of the connection between the implant and the abutment; step (distance) between 5 equidistant points along the contact between the abutment and the implant; the measurements were repeated in 2 perpendicular sections along the joint node axis. The study was conducted on the example of seven implant systems common in Russia. The effect on the implant-abutment assembly of a multiple functional load of 250 N at an angle of 45° (7.6 million cycles) was studied.

RESULTS

It has been established that the precision of the junction of modern implants with standard abutments is different and is characterized by the length of the contact from 268 to 1300 µm, the gap at the level of the platform from 5.0 to 11.7 µm, and the asymmetry of the contact in diameter by 2.4—14.2 µm. Abutments individually made in modern CAD/CAM laboratories do not have significant dimensional differences with standard abutments, but they have technological defects. The functional load expands and deforms the gap between the implant and abutment junction in the upper half of their contact.

CONCLUSION

The results obtained demonstrate the capabilities of the computer X-ray microtomography method, which can be used to control the quality of manufacturing collapsible dental implants, the accuracy of manufacturing individual abutments in CAD/CAM laboratories, as well as in the development of new dental implant systems. The dimensional parameters of the junction node determine the advantages of the deep cone connection of the implant and the abutment.